CL-5000

  Key features:

  • Compact excimer laser
  • Maximum average power stabilization
  • Long lifetime of gas mixture
  • Computer control
  • All-in-one module
  • Premix gas mixture

Applications:

  • Manufacturing of diffractive structures in optical fibers
  • Materials processing
  • Laser engraving

Specifications:

ArF KrF XeCl
Wavelength 193 nm 248 nm 308 nm
Maximum Pulse Energy
20 mJ 40 mJ 25 mJ
Maximum Average Power
CL 5100
CL 5200
CL 5300
2 W
4 W
5 W
4 W
8 W
10 W
2.5 W
5 W
7 W
Max repetition rate
CL 5100
CL 5200
CL 5300
100 Hz
200 Hz
300 Hz
Pulse Duration1
8-11 ns
8-11 ns
Stability of pulse energy sigma < 2%
Beam Size (V x H) 1
12 x 3,5 mm (at 1/e2 of peak)
12 x 4 мм (at 1/e2 of peak)
Beam Divergency (V x H) 1 4 mrad x 2 mrad (stable resonator)
Time jitter < 2 ns
Dimensions, mm 780 L x 330 W x 583 H
Weight, kg 80
Cooling
CL 5100
CL 5200/5300
 

air
water <1 l/min

Power Consumption 220 V, 50 Hz, ≤ 1000 VA * 
Gas 1 premix cylinder
Control RS 232, Windows
1 – FWHM
* – option 110V/60 Hz, ≤ 1000 VA